![]() ![]() Monte Carlo error analysis was used to determine the validity of the peak fit models used. ![]() This paper also demonstrated how to construct a constrained peak model with the aid of chemical knowledge and supporting evidence of the sample. This example offered an opportunity for the investigation of X‐ray damage on polymers encountered in XPS imaging analysis. It was found that delamination occurred by interfacial failure, and the coating suffered complete delamination from a PMMA substrate. XPS imaging analysis has been applied in understanding the delamination problems of siloxane coatings on polymethyl‐methacrylate (PMMA) polymer. The phenomenon was also observed previously by Furukawa et al., as a result of bond breakage of the sulfone group in SPI by the argon sputtering 14. It was noted that most of the S2p peak detected at 165 eV shifted to 160 eV. The recent development of X‐ray Photoelectron Spectroscopy (XPS) instrumentation with spatial resolution down to several microns has advanced the capability of elemental and chemical state imaging. Figure 8a shows changes of the XPS peaks with sputtering time of the 0.5 phr blends film. Application of XPS imaging analysis in understanding interfacial delamination and X‐ray radiation degradation of PMMA Application of XPS imaging analysis in understanding interfacial delamination and X‐ray radiation. ![]()
0 Comments
Leave a Reply. |
AuthorWrite something about yourself. No need to be fancy, just an overview. ArchivesCategories |